Search results for "MOLECULAR-BEAM EPITAXY"

showing 4 items of 4 documents

MBE growth and properties of low-density InAs/GaAs quantum dot structures.

2011

We present the results of a comprehensive study carried out on morphological, structural and optical properties of InAs/GaAs quantum dot structures grown by Molecular Beam Epitaxy. InAs quantum dots were deposited at low growth rate and high growth temperature and were capped with InGaAs upper confining layers. Owing to these particular design and growth parameters, quantum dot densities are in the order of 4-5x109 cm-2 with emission wavelengths ranging from 1.20 to 1.33 µm at 10 K, features that make these structures interesting for single-photon operation at telecom wavelength. High resolution structural techniques show that In content and composition profiles in the structures depend on …

Arrhenius equationeducation.field_of_studystructural and optical characterizationPhotoluminescenceMaterials scienceCondensed matter physicslow-dimensional semiconductor systemsCondensed Matter::OtherPopulationmolecular-beam epitaxyGeneral ChemistryCondensed Matter PhysicsEpitaxyCondensed Matter::Mesoscopic Systems and Quantum Hall Effectlow-dimensional semiconductor systems molecular-beam epitaxy structural and optical characterizationsymbols.namesakeCondensed Matter::Materials ScienceQuantum dotQuantum dot lasersymbolsGeneral Materials ScienceeducationMolecular beam epitaxyWetting layer
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Unraveling the strain state of GaN down to single nanowires

2016

International audience; GaN nanowires (NWs) grown by molecular beam epitaxy are usually assumed free of strain in spite of different individual luminescence signatures. To ascertain this usual assumption, the c/a of a GaN NW assembly has been characterized using both X-ray diffraction and Raman spectroscopy, with scaling the measurement down to the single NW. Free-standing single NWs have been observed free of strain-defined as [c/a = (c/a)(o)]/(c/a)(o)-within the experimental accuracy amounting to 1.25 x 10(-4). However, in the general case, a significant portion of the NWs is coalesced, generating an average tensile strain that can be partly released by detaching the NWs from their substr…

DiffractionMaterials scienceNanowireAnalytical chemistryGeneral Physics and AstronomyNanotechnology02 engineering and technology01 natural sciencessymbols.namesake0103 physical sciencesRaman-ScatteringComputingMilieux_MISCELLANEOUS010302 applied physicsCoalescence (physics)[PHYS]Physics [physics]DopingCiència dels materials021001 nanoscience & nanotechnologyEspectroscòpia RamanFree surfaceMolecular-Beam Epitaxysymbols0210 nano-technologyLuminescenceRaman spectroscopyMolecular beam epitaxy
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Size-filtering effects by stacking InAs/InP (001) self-assembled quantum wires into multilayers

2002

Multilayer structure containing vertically stacked InAs/InP self-assembled quantum wires have been successfully grown by molecular-beam epitaxy. The influence of the InP spacer layer thickness on the structural and optical properties of the wire superlattice has been studied by means of transmission electron microscopy and photoluminescence. The coherent propagation of the strain field in the sample with a 5-nm-thick spacer determines by a size filtering effect a good homogeneity and uniformity of the wire stacks, and hence a good optical quality. The exciton recombination dynamics in the wire superlattice cannot be related to thermal escape of carriers out to the barriers, as occurs in sin…

Materials sciencePhotoluminescenceCondensed matter physicsSuperlatticeExcitonQuantum wiresStackingPhysics::OpticsEpitaxyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter::Materials ScienceMolecular-beam epitaxyTransmission electron microscopyMultilayer structureHomogeneity (physics)ExcitonPhotoluminescenceMolecular beam epitaxy
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Current status of AlInN layers lattice-matched to GaN for photonics and electronics

2007

We report on the current properties of Al1-x InxN (x approximate to 0.18) layers lattice- matched ( LM) to GaN and their specific use to realize nearly strain- free structures for photonic and electronic applications. Following a literature survey of the general properties of AlInN layers, structural and optical properties of thin state- of- the- art AlInN layers LM to GaN are described showing that despite improved structural properties these layers are still characterized by a typical background donor concentration of ( 1 - 5) x 10(18) cm(-3) and a large Stokes shift (similar to 800 meV) between luminescence and absorption edge. The use of these AlInN layers LM to GaN is then exemplified …

PhotoluminescenceMaterials scienceAcoustics and UltrasonicsGallium nitrideSettore ING-INF/01 - ElettronicaVertical-cavity surface-emitting laserchemistry.chemical_compoundMOLECULAR-BEAM EPITAXYALGAN/GAN QUANTUM-WELLSIII-VDISTRIBUTED BRAGG REFLECTORSCRYSTALSURFACE-EMITTING LASERSbusiness.industryREFLECTORSHeterojunctionOPTICAL-PROPERTIESCondensed Matter PhysicsAL1-XINXN THIN-FILMSSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsDISTRIBUTED BRAGGAbsorption edgechemistryOptoelectronicsVAPOR-PHASE EPITAXYIII-V NITRIDESFIELD-EFFECT TRANSISTORSNITRIDESbusinessLiterature surveyCRYSTAL GALLIUM NITRIDELasing thresholdGALLIUM NITRIDEMolecular beam epitaxyJournal of Physics D: Applied Physics
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